Citation:Paul KE, Breen TL, Aizenberg J, Whitesides GM. Maskless Photolithography: Embossed Photoresist as Its Own Optical Element. Appl. Phys. Lett. 1998;73 :2893-2895.Download CitationBibTeX Tagged EndNote XML Download 1998_APL-Maskless....pdf501 KB See also: Fabrication of Nanostructured Surfaces, 1998, Aizenberg, Joanna, Aizenberg LabLast updated on 06/08/2016
Journal Covers 2023_cover_kolle.jpg 2023_cover_pavlichenko.jpg adma202170327-gra-0001-m-2.jpeg 1908242-frontispiece.jpg adma202070159-gra-0001-m.jpg 2020zhangsoftmatter.jpg 2017_shirman_etal_chemeurj.jpg acsamicover.jpg 11.20.cover_.jpg norton_microbiology_cover3.jpg nature2001.jpg nanolett_phil_small.jpg lc012019_ifc.jpg colloid_and_surface_chemistry_bookcover.jpg chemsocrev_cover.jpg chem.chemreactivitycovr.jpg advoptmat2013_wrinkle.jpg advmat.gif acs_nano_lidiya.jpg acs_nano_sung_cover.jpg 2012_nature_protocols_cover.gif afm_cover.jpg adma-cover_fibers.jpg acsnanocover_bucaro2012.jpg acs_nano_lipomi_cover_file.jpg chemsocrev.jpg jsb_cover.jpg hydroglyphics_phil_comp.jpg natmatrev_cover.jpg chemistry_jrnl.jpg Pages12»last
