Mechanism of nanostructure movement under an electron beam and its application in patterning.

Citation:

Seminara A, Pokroy B, Kang SH, Brenner MP, and Aizenberg J. Mechanism of nanostructure movement under an electron beam and its application in patterning. Physical Review B. 2011;83 (235438) :235438-1 - 235438-6.
2011_PhysRevB_Agnese.pdf670 KB

Notes:

This work was supported by the Kavli Institute for Bionano Science and Technology at Harvard University, the Materials Research Science and Engineering Center under NSF Award No. DMR-0820484 and the NSF Award No. DMS-0907985. We acknowledge the use of the facilities at the Harvard Center for Nanoscale Systems supported by NSF Award No. ECS-0335765. A.S. was supported by a Marie Curie International Outgoing Fellowship within the 7th European Community Framework Programme.
Last updated on 06/08/2016