Citation:Paul KE, Breen TL, Aizenberg J, Whitesides GM. Maskless Photolithography: Embossed Photoresist as Its Own Optical Element. Appl. Phys. Lett. 1998;73 :2893-2895.Download CitationBibTeX Tagged EndNote XML Download 1998_APL-Maskless....pdf501 KB See also: Fabrication of Nanostructured Surfaces, 1998, Aizenberg, Joanna, Aizenberg LabLast updated on 06/08/2016
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