Fabrics coated with lubricated nanostructures display robust omniphobicity


Shillingford C, MacCallum N, Wong TS, Kim P, Aizenberg J. Fabrics coated with lubricated nanostructures display robust omniphobicity. Nanotechnology. 2014;25 (1) :014019.


The development of a stain-resistant and pressure-stable textile is desirable for consumer and industrial applications alike, yet it remains a challenge that current technologies have been unable to fully address. Traditional superhydrophobic surfaces, inspired by the lotus plant, are characterized by two main components: hydrophobic chemical functionalization and surface roughness. While this approach produces water-resistant surfaces, these materials have critical weaknesses that hinder their practical utility, in particular as robust stain-free fabrics. For example, traditional superhydrophobic surfaces fail (i.e., become stained) when exposed to low-surface-tension liquids, under pressure when impacted by a high-velocity stream of water (e.g., rain), and when exposed to physical forces such as abrasion and twisting. We have recently introduced slippery lubricant-infused porous surfaces (SLIPS), a self-healing, pressure-tolerant and omniphobic surface, to address these issues. Herein we present the rational design and optimization of nanostructured lubricant-infused fabrics and demonstrate markedly improved performance over traditional superhydrophobic textile treatments: SLIPS-functionalized cotton and polyester fabrics exhibit decreased contact angle hysteresis and sliding angles, omni-repellent properties against various fluids including polar and nonpolar liquids, pressure tolerance and mechanical robustness, all of which are not readily achievable with the state-of-the-art superhydrophobic coatings.


We thank Tom Blough and Jack Alvarenga for their help with the experimental setup. The work was supported partially by the Advanced Research Projects Agency-Energy (ARPA-E), US Department of Energy, under Award Number DE-AR0000326 and the Wyss Institute for Biologically Inspired Engineering at Harvard University. We acknowledge the use of the facilities at the Harvard Center for Nanoscale Systems supported by the NSF under award ECS-0335765.

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Last updated on 05/04/2018